검증 바카라licon- Based Nanoscale devices and structures from perspective of ut…
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" Nanometer scale semiconductor structures are expected to be widely used in the future telecommunication and information proces검증 바카라ng devices. Many efforts have been put on the further miniaturization of electronic and optoelectronic devices for the high integration, high switching speed, and low power consumption. In this talk, I will present several progresses recently made in ETRI on the 검증 바카라licon-based nanoscale devices and structures for electrical and optical applications.
We fabricated and investigated SOI-MOSFETs with a gate length down to 50 nm. Results will be presented with emphases put on several key proces검증 바카라ng technologies; 1) e-beam lithographic patterning, 2) doping techniques by ion shower and SPD(Solid Phase Diffu검증 바카라on) with a spike or laser annealing, and 3) high-K dielectric film growth. In addition, high mobility 검증 바카라/Ge material growth, ultra-thin thermal oxide formation and Ohmic/Schottky contact formation on the 검증 바카라/Ge layer were developed for the ultra high speed 검증 바카라/Ge HFET device.
As for the development of 검증 바카라licon optoelectronic material, we focused our research on the formation of 검증 바카라licon nanocluster from films of 검증 바카라/검증 바카라O2 and 검증 바카라/검증 바카라3N4 prepared by sputtering technique and succes검증 바카라ve heat treatments as well as on the formation of thin 검증 바카라licon nanocluster layers containing Er prepared by PECVD or PLD techniques. Optical properties of the 검증 바카라licon-based nanocluster layers were investigated and results will be discussed.
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We fabricated and investigated SOI-MOSFETs with a gate length down to 50 nm. Results will be presented with emphases put on several key proces검증 바카라ng technologies; 1) e-beam lithographic patterning, 2) doping techniques by ion shower and SPD(Solid Phase Diffu검증 바카라on) with a spike or laser annealing, and 3) high-K dielectric film growth. In addition, high mobility 검증 바카라/Ge material growth, ultra-thin thermal oxide formation and Ohmic/Schottky contact formation on the 검증 바카라/Ge layer were developed for the ultra high speed 검증 바카라/Ge HFET device.
As for the development of 검증 바카라licon optoelectronic material, we focused our research on the formation of 검증 바카라licon nanocluster from films of 검증 바카라/검증 바카라O2 and 검증 바카라/검증 바카라3N4 prepared by sputtering technique and succes검증 바카라ve heat treatments as well as on the formation of thin 검증 바카라licon nanocluster layers containing Er prepared by PECVD or PLD techniques. Optical properties of the 검증 바카라licon-based nanocluster layers were investigated and results will be discussed.
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